DuPont™ Kalrez® Parts for the Semiconductor Industry
Trust the semiconductor products that have been used successfully in highly aggressive sealing environments for over three decades. Kalrez® perfluoroelastomer (FFKM) parts feature excellent thermal and chemical stability and have been formulated and processed to meet the unique requirements of wafer processing.
These Kalrez® molded o-rings and custom seals are made using speciality products and ultrapure processing* for the semiconductor industry.
* Ultrapure processing standard for all semiconductor product grades; must be specified for Kalrez® 6375UP and 7075UP
Kalrez® Semiconductor Product Selection Guide
|Process Type||Typical Seal Temperature||Typical Process Environment||Suggested Products*||Comments||Typical Applications|
|Plasma Processes||PECVD/ALD/ HDPCVD||250°C||TMS, DEMS, TEOS, SiH4, C3H6, NH3, SiF4, O2, N2O, NF3||9100||9100 – Low erosion rate and ultra-low particle generation|
9500 – Excellent resistance to ozone, ammonia, steam and plasma radicals.
8705 – Excellent resistance to UV light
9300 – Excellent resistance to plasma ions and radicals
8002 – Excellent resistance to oxygen plasma
• Door seals
• Gate valves
• Pendulum valves
• Chamber lid seals
• Exhaust valves
• Gas inlet/outlet/mixing block seals
• Window seals
• Center ring seals
• Seals for heat-traced lines in sub-fab foreline and exhaust systems*
|PECVD Curing Process||200°C||O3, UV light||8705* Quartz Window Seal
9500* All other seal locations
|SACVD / FCVD||280°C||TEP, TEBO, TEOS, O3, NF3, NH3||9500|
|Ash/Strip||200°C||O2, CF4, CHF3, NH3, Water Vapor, Forming Gas||8002|
|Dielectric (Oxide) Etch||200°C||CF4, C3F8, CHF3, SF6,O2, H2,||9300|
|Conductor (Poly/Metal) Etch||200°C||CF4, CHF3, HBr, BCl3, CCl4, Cl2||9100|
|280°C||SiH4, HF, F2, Cl2, NF3, H2O Vapor, O2||8900||8900 – Excellent thermal stability and very low outgassing properties.|
7075UP – Excellent resistance to ClF3.
8575 – Low IR absorption due to white color.
|• Quartz chamber
• Center ring
• Plenum seals
|Metal CVD||280°C||Organic precursors, WF6, TiCl4, ClF3, NF3||7075UP|
|300°C||N2, O2, H2O, HCl, Cl2, O3||8900
|Wet Processes||Wafer Prep||125°C||UPDI, Piranha, SC-1, SC-2, O3, HF (49%)||6375UP||6375UP – General purpose product for all wet process applications.||• Door/lid seals
• Drain seals
• Seals for chemical containers
• Seals for filters/ connectors
• Flow meters
|Etching||180°C||HNO3, HF, H2O, H3PO4, HNO3|
|Photolithography||125°C||H2SO4 + Oxidant, Organic Acids, nMP|
|Copper Plating||100°C||CuSO4 Solution H2SO4, H2O2|
* Please consult a Kalrez® Application Engineer to assess performance fit in your application. Please refer to the Kalrez® Application Guide
(www.kalrez.com) for specific chemical compatibility ratings for Kalrez® products.
C&B Equipment Is a Licensed Kalrez® Distributor
C&B Equipment is proud to be a Licensed Distributor of Kalrez parts®. The superior performance of these seals helps you increase your uptime—the mission that guides everything we do. Contact us today for your standard or custom Kalrez® parts.